[Used ICP]ICP RIE Etcher TAINICS TE-3100

Type : ICP_RIE Etcher Model : TE 3100 Application : Sapphire Substrate Etching for LED Mass production Application Process : Normal GaN Etch, High GaN Etch, PSS Etch

PSS GaN 2" Wafer No/Tray 18pcs 20pcs 4"wafer No/Tray 5pcs 5pcs PR treatment None(Require more information) None(Require more information) Gas BCl3 based Cl2 based Cleaning Gas CF4, O2 CF4, O2 Selectivity ≥ 0.6 at PR ≥0.8 at PR Non Uniformity (%nu) ≤±7%(Mass Production) ≤±5%(Process Test) ≤±5%(Mass Production) ≤±3%(Process Test) Adventage High Throughput & Etching Rate, Good uniformity, Easy handling and long life time of wafer holder . High Throughput & Etching Rate, Good uniformity, Easy handling and long life time of wafer holder .  Wafer Holder No. TWH-12MT-B TWH-12AC-A Note : TWH-12MT-B is one model of the Tainics's Tray for PSS process. TWH-12AC-A is one model of the Tainics's Tray for MESA process.

Maker : TAINICS
Model : TE3100

Vintage : 2008

Mail : phm7910@naver.com
Mobile : +821037623650